A POLISHING MIXTURE

Proposed polishing composition provides increase of output of capable detector modules and increase of radiosenstitivity thereof. It comprises low-molecular polyorganosiloxane caoutchouc of CKTH-MED type having viscosity of 7 poise as wetting liquid and high-dispersed silicon dioxide in quantity of...

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Bibliographische Detailangaben
Hauptverfasser:	HALKIN SERHII MYKOLAIOVYCH, VORONKOV YEVHENII FEDOROVYCH, KVITNYTSKA VALENTYNA ZAKHARIVNA, OPOLONIN OLEKSANDR DMYTROVYCH, RYZHYKOV VOLODYMYR DIOMYDOVYCH, KOZYN DMYTRO MYKOALIOVYCH
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DYES MEASUREMENT OF NUCLEAR OR X-RADIATION MEASURING METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PHYSICS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TESTING
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Beschreibung
Zusammenfassung:	Proposed polishing composition provides increase of output of capable detector modules and increase of radiosenstitivity thereof. It comprises low-molecular polyorganosiloxane caoutchouc of CKTH-MED type having viscosity of 7 poise as wetting liquid and high-dispersed silicon dioxide in quantity of 2-3 weight % as an abrasive material.