MAGNETRON SPRAYING MECHANISM

A magnetron spraying mechanism concerns ion-plasma technology of sputtering thin films and protective coatings in making integrated circuits and electronic devices of functional diagnostics. Magnetron spraying mechanism has two planar magnetic systems with targets, disposed at an angle of 60°-120° a...

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Bibliographische Detailangaben
Hauptverfasser:	BEDIUKH OLEKSANDR RADIIOVYCH, KUCHERENKO YEVHEN TROKHYMOVYCH, KRAVCHENKO OLEKSANDR IVANOVYCH
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A magnetron spraying mechanism concerns ion-plasma technology of sputtering thin films and protective coatings in making integrated circuits and electronic devices of functional diagnostics. Magnetron spraying mechanism has two planar magnetic systems with targets, disposed at an angle of 60°-120° and two power supplies, which are switched in parallel to magnetic systems, one of them is of high frequency and another one is of low frequency. The technical result consists in providing possibility of obtaining films of metal semiconductor and dielectric coatings and two component coatings.