METHOD OF ANTIFUNGAL TREATMENT OF FILM

The proposed method of antifungal treatment of film is distinctive by using 0.1 ... 0.3 % water solution of tetramix. The treatment is performed for 1.5 ... 3 minutes.

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Bibliographische Detailangaben
Hauptverfasser:	ZHEMEROVA KATERYNA HEORHIIVNA, KRYSHTAL VOLODYMYR SERHIIOVYCH, NEKRASOV ANATOLII OLEKSANDROVYCH, MASLOV VOLODYMYR DMYTROVYCH, HUZHVA MYKOLA MYKHAILOVYCH, BRAZHNYKOVA DIANA OLEKSANDRIVNA, YEREMENKO VIKTOR ANTONOVYCH, TRUFANOV MYKOLA IVANOVYCH
Format:	Patent
Sprache:	eng
Schlagworte:	AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	The proposed method of antifungal treatment of film is distinctive by using 0.1 ... 0.3 % water solution of tetramix. The treatment is performed for 1.5 ... 3 minutes.