VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE

The present invention relates to A Method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility comprising a vacuum chamber, a substrate coated with at least one metal on both sides of the substrate having an average thicknes...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Bonnemann, Rémy, Pace, Sergio, Silberberg, Eric
Format:	Patent
Sprache:	eng ; ukr
Online-Zugang:	Volltext bestellen
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