Electrostatic chuck and o-ring thereof

The present invention provides an O-Ring for an electrostatic chuck. The O-Ring comprises a ring body which is composed of an anti-thermal and anti-plasma damage material. In addition, the ring body can seal the gap formed in the electrostatic chuck to prevent the inside of the electrostatic chuck f...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	LIAO, CHIN-YA, WANG, KUNG-SHU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MACHINE TOOLS MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS METAL-WORKING NOT OTHERWISE PROVIDED FOR PERFORMING OPERATIONS SEMICONDUCTOR DEVICES TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention provides an O-Ring for an electrostatic chuck. The O-Ring comprises a ring body which is composed of an anti-thermal and anti-plasma damage material. In addition, the ring body can seal the gap formed in the electrostatic chuck to prevent the inside of the electrostatic chuck from being etched by plasma.