CVD apparatus and shadow frame thereof

A shadow frame applied for jointing with a stage to cover the peripheral area of a substrate loaded thereon. The shadow frame comprises of a step structure with a step plane and a step sidewall wherein a fillister on the step sidewall is formed, a orientation plate for lodging in the fillister inclu...

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Bibliographische Detailangaben
Hauptverfasser: CHENG, TSUNGI, LEE, TING-HUI, HSU, MINGUN, HSIAO, WEN-YING
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:A shadow frame applied for jointing with a stage to cover the peripheral area of a substrate loaded thereon. The shadow frame comprises of a step structure with a step plane and a step sidewall wherein a fillister on the step sidewall is formed, a orientation plate for lodging in the fillister including a plane surface and a side surface, wherein a orientation hole on the plane surface is defined for the alignment between the shadow frame and the stage, and at least one screw hole on the sidewall surface is formed and penetrates through the orientation plate. A screw is applied via the screw hole to fasten the orientation plate with the step structure.