Substrate support suitable for using in a semiconductor processing chamber

A coating has a cylindrical body (914) comprising upper and lower edges, and a flange extending radially outwards from the upper edge. A recess (932) is formed in an outer surface of the body. A slit (938) is arranged in the recess and passes through the body, where the body is coated by yttrium or...

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Bibliographische Detailangaben
Hauptverfasser: DAO, HUUTRI, DINEV, JIVKO, PAMARTHY, SHARMA, MCDONOUGH, KELLY A, ZHOU, XIAO-PING
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A coating has a cylindrical body (914) comprising upper and lower edges, and a flange extending radially outwards from the upper edge. A recess (932) is formed in an outer surface of the body. A slit (938) is arranged in the recess and passes through the body, where the body is coated by yttrium or yttrium oxide. A lip (918) extends from an inner surface of the body in a radially inward manner, where the lip has an upper surface.