A method of obtaining metrology data of features on at least part of a substrate, a computing system, and, a non-transitory computer-readable medium

A method of determining a field of view setting for an inspection tool having a configurable field of view, the method including: obtaining a process margin distribution of features on at least part of a substrate; obtaining a threshold value; identifying, in dependence on the obtained process margi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PRENTICE, CHRISTOPHER, THUIJS, KOEN, DILLEN, HERMANUS ADRIANUS, TEL, WIM TJIBBO, DEPRE, LAURENT MICHEL MARCEL
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!