A method of obtaining metrology data of features on at least part of a substrate, a computing system, and, a non-transitory computer-readable medium

A method of obtaining metrology data of features on at least part of a substrate, a computing system, and, a non-transitory computer-readable medium

A method of determining a field of view setting for an inspection tool having a configurable field of view, the method including: obtaining a process margin distribution of features on at least part of a substrate; obtaining a threshold value; identifying, in dependence on the obtained process margi...

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Bibliographische Detailangaben
Hauptverfasser: PRENTICE, CHRISTOPHER, THUIJS, KOEN, DILLEN, HERMANUS ADRIANUS, TEL, WIM TJIBBO, DEPRE, LAURENT MICHEL MARCEL
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A method of determining a field of view setting for an inspection tool having a configurable field of view, the method including: obtaining a process margin distribution of features on at least part of a substrate; obtaining a threshold value; identifying, in dependence on the obtained process margin distribution and the threshold value, one or more regions on at least part of the substrate; and determining the field of view setting in dependence on the identified one or more regions.