Method of acquiring drawing position information and drawing method

To provide a drawing position information acquisition method capable of improving relative position accuracy of a pattern drawn on both principal surfaces of a substrate.SOLUTION: A drawing position information acquisition method comprises: a step (step S33) for imaging a first principal surface of...

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Bibliographische Detailangaben
Hauptverfasser: MAEDA, MINEYUKI, HISANO, MASASHI, WATANABE, TAKATSUGU
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:To provide a drawing position information acquisition method capable of improving relative position accuracy of a pattern drawn on both principal surfaces of a substrate.SOLUTION: A drawing position information acquisition method comprises: a step (step S33) for imaging a first principal surface of a correction substrate, and acquiring positions of two first reference marks; a step (step S34) for drawing a plurality of alignment marks on a second principal surface of the correction substrate; a step (step S36) for imaging the second principal surface of the correction substrate, and acquiring positions of two second reference marks and positions of the plurality of alignment marks; and a step (step S37) for acquiring drawing position information related to drawing positions of the plurality of alignment marks by an alignment mark drawing part, on the basis of the positions of the two first reference marks, and the positions of the two second reference marks and positions of the plurality of alignment marks. T