TWI852145B

A writing apparatus irradiates a predetermined position on an irradiation target with multiple charged particle beams to write a predetermined pattern on the irradiation target. The writing apparatus includes a beam generation mechanism generating multiple charged particle beams; a blanking aperture mechanism comprising a limiting aperture substrate shielding the generated multiple charged particle beams and a deflector deflecting the multiple charged particle beams in a predetermined direction, and blanking the multiple charged particle beams; a stage having the irradiation target mounted thereon and being movable; a driver moving the limiting aperture substrate; and a controller controlling the writing apparatus. The controller moves the limiting aperture substrate from an arrangement location at the time of writing in a plane perpendicular to an axial direction of the multiple charged particle beams in a blanking period, and returns the limiting aperture substrate to the arrangement location at the time of