Method for compensating actuator effects of actuators

Method for compensating actuator effects of actuators

The invention relates to a method for driving an actuator for a component (Mx, 117) of a projection exposure apparatus (1, 101) for semiconductor lithography, comprising the following steps: - characterizing (30) the actuator, - parameterizing (31) an actuator model, - implementing (32) the actuator...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: RAAB, MARKUS, JOERG, PHILIPP, POLLAK, THILO, ESSIG, PETER, BAUEREGGER, STEFAN, TIETSCH, VOLKER, PAARMANN, DAGMAR, MANGER, MATTHIAS, WITT, AXEL
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:The invention relates to a method for driving an actuator for a component (Mx, 117) of a projection exposure apparatus (1, 101) for semiconductor lithography, comprising the following steps: - characterizing (30) the actuator, - parameterizing (31) an actuator model, - implementing (32) the actuator model in a control structure, - driving (34) the actuator using the actuator model.