Method and device for predicting post-processing defects of wafer

Embodiments of the present invention provide a method and device for predicting post-processing defects of a wafer. The method includes: obtaining a first wafer, and determining a first statistical characteristic of a characteristic value of the first wafer before the first wafer is processed; obtai...

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Bibliographische Detailangaben
Hauptverfasser:	TSAI, CHIAI, LIN, BO-TING, WANG, SHANGI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTING COUNTING DATA PROCESSING SYSTEMS OR METHODS, SPECIALLY ADAPTED FORADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL, SUPERVISORYOR FORECASTING PURPOSES ELECTRIC DIGITAL DATA PROCESSING INFORMATION STORAGE INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES PHYSICS STATIC STORES SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE,COMMERCIAL, FINANCIAL, MANAGERIAL, SUPERVISORY OR FORECASTINGPURPOSES, NOT OTHERWISE PROVIDED FOR TESTING
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Beschreibung
Zusammenfassung:	Embodiments of the present invention provide a method and device for predicting post-processing defects of a wafer. The method includes: obtaining a first wafer, and determining a first statistical characteristic of a characteristic value of the first wafer before the first wafer is processed; obtaining a plurality of defects of the first wafer after the first wafer is processed; determining a specific correlation between the first statistical characteristic and the plurality of defects according to the first statistical characteristic corresponding to the first wafer and a statistical threshold; obtaining a second wafer corresponding to the first wafer, and determining a second statistical characteristic of a characteristic value of the second wafer before the second wafer is processed; and predicting a number of post-processing defects of the second wafer corresponding to the statistical threshold based on the second statistical characteristic and the specific correlation.