Etching equipment having vacuum suction device

The present invention discloses an etching equipment having vacuum suction device, which can be disposed in a DES process line, so as to conduct a developing process, an etching and a stripping process, and can also be disposed in a SES process line to conduct a first stripping process, an etching and a second stripping process. The etching equipment comprises: an etching room, a PCB transport mechanism, an etching solution spraying unit, and a plurality of vacuum suction devices, in which the PCB transport mechanism consists of a plurality of upper transmission shafts and a plurality of lower transmission shafts, and there are a plurality of rollers disposed on each said upper transmission shaft. Moreover, each said roller has a diameter, and each said vacuum suction device has a device width. According to the present invention, the device width is set to be n times as great as the diameter, and n is in a range between 2 and 5. By such arrangements, in case of there being at least one PCB delivered in to the