TWI843435B

This Co-Cr-Pt-B ferromagnetic body sputtering target is characterized by comprising: a Co-Cr-Pt-B alloy phase (A) that includes B in the amount of more than 0 at% but not more than 30 at%, where B aggregate phase is not eccentrically located and B is distributed throughout; and an alloy phase (B) wh...

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Bibliographische Detailangaben
1. Verfasser:	KAMADA, TOMONARI
Format:	Patent
Sprache:	chi
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	This Co-Cr-Pt-B ferromagnetic body sputtering target is characterized by comprising: a Co-Cr-Pt-B alloy phase (A) that includes B in the amount of more than 0 at% but not more than 30 at%, where B aggregate phase is not eccentrically located and B is distributed throughout; and an alloy phase (B) which is a Co-B alloy, a Co-Cr-B alloy, or a Co-Pt-B alloy, and which includes B in the amount of more than 0 at% but not more than 20 at%, where B aggregate phase is not eccentrically located and B is distributed throughout. The alloy phase (A) accounts for 50 vol% or more of the sputtering target, and the alloy phase (B) accounts for less than 50 vol% of the sputtering target.