Switchable delivery for semiconductor processing system

Exemplary semiconductor processing systems may include a processing chamber including a lid stack having an output manifold. The systems may include a gas panel. The systems may include an input manifold. The input manifold may fluidly couple the gas panel with the output manifold of the processing...

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Bibliographische Detailangaben
Hauptverfasser: BALASUBRAMANIAN, GANESH, SRIVASTAVA, SHAILENDRA, CHEN, YUE, BENJAMIN RAJ, DAEMIAN RAJ, JIANG, ZHIJUN, ADDEPALLI, SAI SUSMITA, MA, QIANG, KESHRI, ABHIGYAN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Exemplary semiconductor processing systems may include a processing chamber including a lid stack having an output manifold. The systems may include a gas panel. The systems may include an input manifold. The input manifold may fluidly couple the gas panel with the output manifold of the processing chamber. A delivery line may extend from the input manifold to the output manifold. The systems may include a first transmission line extending from a first set of precursor sources of the gas panel to the delivery line. The systems may include a second transmission line extending from a second set of precursor sources of the gas panel to the delivery line. The second transmission line may be switchably coupled between the delivery line and an exhaust of the semiconductor processing system.