TWI841340B

This non-photosensitive surface modifier is for forming a surface modification layer between a metal layer and a resin layer, and at least includes a heterocyclic compound having a structure of general formula (W) or general formula (Y), the heterocyclic compound being contained in a concentration o...

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Bibliographische Detailangaben
Hauptverfasser: HARA, JUN, MIKOSHIBA, EMIKO
Format: Patent
Sprache:chi
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Beschreibung
Zusammenfassung:This non-photosensitive surface modifier is for forming a surface modification layer between a metal layer and a resin layer, and at least includes a heterocyclic compound having a structure of general formula (W) or general formula (Y), the heterocyclic compound being contained in a concentration of 0.001-0.01 mass%. [In the formulae, Rn1 and Rn2 each represent an alkyl group; L represents a linking group; W1 to W7 each represent a carbon atom or a nitrogen atom, at least two thereof being nitrogen atoms, one of which is NH, and W1 to W7 form a fused ring together; Y1 to Y5 each represent a carbon atom or a nitrogen atom, at least two thereof being nitrogen atoms, one of which is NH, and Y1 to Y5 form a fused ring together; and m is an integer of 1 or larger.]