Substrate processing apparatus

The present invention provides a substrate processing apparatus. A substrate processing apparatus (1) includes a first transport section (6a) and a second transport section (6b). The second transport section (6b) is located below the first transport section (6a). The first transport section (6a) inc...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KAWAHARA, HIROYUKI, KIKUMOTO, NORIYUKI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention provides a substrate processing apparatus. A substrate processing apparatus (1) includes a first transport section (6a) and a second transport section (6b). The second transport section (6b) is located below the first transport section (6a). The first transport section (6a) includes a first transport space (61a), first transport FFUs (11 and 12), and a first floor section (71). The first transport FFUs (11 and 12) are located above the first transport space (61a). The first floor section (71) has a plurality of first through holes. The first floor section (71) is located below the first transport space (61a). The second transport section (6b) includes a second transport space (61b), second transport FFUs (13 and 14), a second floor section (72), and an exhaust fan (73). The second transport FFUs (13 and 14) are located below the first floor section (71). The second floor section (72) has a plurality of through holes. The second floor section (72) is located below the second transport spa