TWI839838B

There is provided a technique that includes: a process chamber in which a substrate is processed; a gas supplier configured to supply a gas into the process chamber; a microwave supplier configured to supply a microwave into the process chamber; and a microwave stirrer configured to stir the microwa...

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Hauptverfasser:	NABETA, KAZUYA, MORIKAWA, HARUO, YANAGISAWA, YOSHIHIKO
Format:	Patent
Sprache:	chi
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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creator	NABETA, KAZUYA MORIKAWA, HARUO YANAGISAWA, YOSHIHIKO
description	There is provided a technique that includes: a process chamber in which a substrate is processed; a gas supplier configured to supply a gas into the process chamber; a microwave supplier configured to supply a microwave into the process chamber; and a microwave stirrer configured to stir the microwave by being rotated due to a flow of the gas in the process chamber.
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subjects	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
title	TWI839838B
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