TWI839838B

TWI839838B

There is provided a technique that includes: a process chamber in which a substrate is processed; a gas supplier configured to supply a gas into the process chamber; a microwave supplier configured to supply a microwave into the process chamber; and a microwave stirrer configured to stir the microwa...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NABETA, KAZUYA, MORIKAWA, HARUO, YANAGISAWA, YOSHIHIKO
Format: Patent
Sprache:chi
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:There is provided a technique that includes: a process chamber in which a substrate is processed; a gas supplier configured to supply a gas into the process chamber; a microwave supplier configured to supply a microwave into the process chamber; and a microwave stirrer configured to stir the microwave by being rotated due to a flow of the gas in the process chamber.