Apparatus for measuring overlay

An overlay measurement apparatus that can quickly measure an overlay error between layers with a large height difference is provided. The overlay measurement apparatus measures an error between a first overlay mark and a second overlay mark formed in a pair on different layers of a wafer. The overla...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PARK, JIN WOO, SHIN, HYEON GI, RYU, BO KYUNG, KO, JUNG SUN
Format: Patent
Sprache:chi ; eng
Schlagworte:
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