TWI831047B
[Problem] To provide a layered film for pattern formation which does not absorb moisture in the air or leave unnecessary components on the surface of a plate film, and in which the tackiness of a photosensitive resin layer is suppressed. [Solution] Provided are: a layered film for pattern formation...
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| creator | ADACHI, DAISAKU OHMI, MAMORU OHUE, ATSUSHI IWATA, SHUJI MIYASHITA, NAOKI |
| description | [Problem] To provide a layered film for pattern formation which does not absorb moisture in the air or leave unnecessary components on the surface of a plate film, and in which the tackiness of a photosensitive resin layer is suppressed. [Solution] Provided are: a layered film for pattern formation characterized by comprising a support layer, an adhesive layer, a water-insoluble polymer layer, and a photosensitive resin layer in the given order; a non-photosensitive screen printing plate in which the layered film for pattern formation is employed; and a method for manufacturing same. |
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[Solution] Provided are: a layered film for pattern formation characterized by comprising a support layer, an adhesive layer, a water-insoluble polymer layer, and a photosensitive resin layer in the given order; a non-photosensitive screen printing plate in which the layered film for pattern formation is employed; and a method for manufacturing same.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOAKCfe0MDY0MDF34mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8QgNTsZEKAEACHMbdg</recordid><startdate>20240201</startdate><enddate>20240201</enddate><creator>ADACHI, DAISAKU</creator><creator>OHMI, MAMORU</creator><creator>OHUE, ATSUSHI</creator><creator>IWATA, SHUJI</creator><creator>MIYASHITA, NAOKI</creator><scope>EVB</scope></search><sort><creationdate>20240201</creationdate><title>TWI831047B</title><author>ADACHI, DAISAKU ; OHMI, MAMORU ; OHUE, ATSUSHI ; IWATA, SHUJI ; MIYASHITA, NAOKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TWI831047BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ADACHI, DAISAKU</creatorcontrib><creatorcontrib>OHMI, MAMORU</creatorcontrib><creatorcontrib>OHUE, ATSUSHI</creatorcontrib><creatorcontrib>IWATA, SHUJI</creatorcontrib><creatorcontrib>MIYASHITA, NAOKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ADACHI, DAISAKU</au><au>OHMI, MAMORU</au><au>OHUE, ATSUSHI</au><au>IWATA, SHUJI</au><au>MIYASHITA, NAOKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TWI831047B</title><date>2024-02-01</date><risdate>2024</risdate><abstract>[Problem] To provide a layered film for pattern formation which does not absorb moisture in the air or leave unnecessary components on the surface of a plate film, and in which the tackiness of a photosensitive resin layer is suppressed. [Solution] Provided are: a layered film for pattern formation characterized by comprising a support layer, an adhesive layer, a water-insoluble polymer layer, and a photosensitive resin layer in the given order; a non-photosensitive screen printing plate in which the layered film for pattern formation is employed; and a method for manufacturing same.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | TWI831047B |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T02%3A06%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ADACHI,%20DAISAKU&rft.date=2024-02-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETWI831047BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |