TWI831047B

[Problem] To provide a layered film for pattern formation which does not absorb moisture in the air or leave unnecessary components on the surface of a plate film, and in which the tackiness of a photosensitive resin layer is suppressed. [Solution] Provided are: a layered film for pattern formation...

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Bibliographische Detailangaben
Hauptverfasser:	ADACHI, DAISAKU, OHMI, MAMORU, OHUE, ATSUSHI, IWATA, SHUJI, MIYASHITA, NAOKI
Format:	Patent
Sprache:	chi
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	[Problem] To provide a layered film for pattern formation which does not absorb moisture in the air or leave unnecessary components on the surface of a plate film, and in which the tackiness of a photosensitive resin layer is suppressed. [Solution] Provided are: a layered film for pattern formation characterized by comprising a support layer, an adhesive layer, a water-insoluble polymer layer, and a photosensitive resin layer in the given order; a non-photosensitive screen printing plate in which the layered film for pattern formation is employed; and a method for manufacturing same.