Substrate processing method and substrate processing apparatus
The present invention suppresses damage to a substrate, when the substrate is moved from a batch processing unit to a sheet processing unit. This substrate processing method comprises: a step for, in a batch processing unit, immersing a plurality of substrates in a liquid chemical; a step for, in th...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The present invention suppresses damage to a substrate, when the substrate is moved from a batch processing unit to a sheet processing unit. This substrate processing method comprises: a step for, in a batch processing unit, immersing a plurality of substrates in a liquid chemical; a step for, in the batch processing unit, washing off the substrate that has been immersed in the liquid chemical using a rinsing agent; a step for, in the batch processing unit, replacing at least a portion of the rinsing agent on the substrate with IPA; a step for moving the substrate on which the rinsing agent has been replaced with IPA to the sheet processing unit; and a step for drying the substrate in the sheet processing unit. |
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