System and method for processing a substrate

A system comprises an equipment front end module (EFEM), a vacuum transfer module (VTM), a plurality off quad station process modules (QSMs). The EFEM is configured to receive a plurality of wafers. The EFEM comprises an EFEM transfer robot. The vacuum transfer module (VTM) is configured to receive...

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Bibliographische Detailangaben
Hauptverfasser: BURKHART, CHRISTOPHER W, YASUUMI, HIRONOBU, NORDIN, MICHAEL, KRISTOFFERSEN, CANDI, BLANK, RICHARD M, GOULD, RICHARD H
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A system comprises an equipment front end module (EFEM), a vacuum transfer module (VTM), a plurality off quad station process modules (QSMs). The EFEM is configured to receive a plurality of wafers. The EFEM comprises an EFEM transfer robot. The vacuum transfer module (VTM) is configured to receive the plurality of wafers from the EFEM. The VTM comprises a VTM transfer robot. The plurality of quad station process modules (QSMs) is coupled to the VTM. The VTM transfer robot is configured to transfer wafers between the VTM and the plurality of QSMs. The EFEM transfer robot is configured to transfer wafers between the EFEM and the VTM.