TWI828132B

A confinement ring, a plasma processing apparatus and an exhaust control method thereof are provided, the confinement ring surrounds between a base periphery in a reaction chamber of the plasma processing apparatus and a side wall of the reaction chamber, the confinement ring includes at least one annular assembly forming an annular structure, the annular assembly includes a main body portion having a plurality of gas channels, and the gas channels are formed in the main body portion. And the height adjusting device is used for adjusting the height of the gas channel. A height adjusting device in the annular assembly is driven to move, and the height of a gas channel in the annular assembly is adjusted, so that the gas flow distribution in the reaction cavity is adjusted. The gas flow distribution in the reaction cavity is adjusted and balanced by uniformly or respectively adjusting the height of the gas channel in the restraint ring in multiple areas, and the device is high in operability and adaptability. T