TWI825355B

Provided is an exposure device having a structure advantageous for reducing vibration of an optical system. The exposure device for exposing a substrate includes: a projection optical system for projecting a pattern of a circular plate onto the substrate; a chamber for accommodating the projection o...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	SHIMURA, MASATO
Format:	Patent
Sprache:	chi
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Provided is an exposure device having a structure advantageous for reducing vibration of an optical system. The exposure device for exposing a substrate includes: a projection optical system for projecting a pattern of a circular plate onto the substrate; a chamber for accommodating the projection optical system; a shutter which closes an opening provided in the chamber during exposure to transport the substrate; and an adjustment unit for adjusting the attenuation effect of sound from the outside of the chamber by the shutter.