Transparent conductive film and manufacturing method thereof

A method of manufacturing a transparent conductive film includes the follow steps. A substrate is fed and a metal nanowire ink is coated on a main surface of the substrate. The metal nanowire ink is then dried to form a metal nanowire layer. A first argon plasma treatment process is performed in a vacuum chamber for surface treatment of the metal nanowire layer with an argon plasma gas, wherein the argon plasma gas is used to treat the metal nanowire layer for 15-30 seconds at a working pressure of 50-150 mTorr and a power of 600-1800 W. A resin layer is coated on the metal nanowire layer, and the resin layer is cured to composite with the metal nanowire layer to form a metal nanowire material layer.