WAFER CLEANING APPARATUS AND LEAKAGE DETECTION METHOD THEREOF

A wafer cleaning apparatus includes a chamber, a rotary chuck, a liquid spray post, a top lid, a liquid conveying pipeline, a protection pipeline, and a leak sensor. The rotary chuck is located in the chamber, and is configured to attach a wafer cassette. The liquid spray post is located in the cham...

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Bibliographische Detailangaben

1. Verfasser:	PENG, KUO-HAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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