Gas-pulsing-based shared precursor distribution system and methods of use

Gas-pulsing-based shared precursor distribution system and methods of use

Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared...

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Bibliographische Detailangaben
Hauptverfasser: AUBUCHON, JOSEPH, JOSEPHSON, MARCEL E, RICE, MICHAEL, KOSHTI, SUSHANT SURESH, LE, KENNETH, XU, MING, FERNANDEZ, ALEXANDER, OKADA, ASHLEY M, BRASHEAR, KEVIN M, BALUJA, SANJEEV
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.