System for an extreme ultraviolet (euv) light source and method of forming a target for an euv light source

A system includes a spatial modulation device configured to interact with a light beam to create a modified light beam, the modified light beam including a spatial pattern of light that has a non-uniform intensity along a direction that is perpendicular to a direction of propagation of the modified light beam, the spatial pattern of light including one or more components of light; and a target supply system configured to provide a target to a target region, the target including target material that, when in a plasma state, emits EUV light. The target region overlaps with the beam path such that at least some of the one or more components of light in the modified beam interact with a portion of the target.