TWI816763B

TWI816763B

The present invention provides an exposure device, which is constituted by a substrate conveying system capable of suppressing the meandering of a long substrate. In the exposure device (10') in which the roll-to-roll conveying system can move along the substrate conveying direction M together...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MATSUNAGA, SHINICHI, MIDORIKAWA, SATORU
Format: Patent
Sprache:chi
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:The present invention provides an exposure device, which is constituted by a substrate conveying system capable of suppressing the meandering of a long substrate. In the exposure device (10') in which the roll-to-roll conveying system can move along the substrate conveying direction M together with the exposure stage (15), a tension roller (36) is provided on the downstream side of the exposure stage (15). Also, in the movement of the Roll-to-Roll conveying system, the tension roller (36) changes position with respect to the other rollers and applies tension to suppress the deflection of the long substrates W1, W2.