Optical element for the beam guidance of imaging light in projection lithography, method for producing an adjusted optical element, imaging optical unit, optical system, projection exposure apparatus, method for producing a structured component, and structured component

Optical element for the beam guidance of imaging light in projection lithography, method for producing an adjusted optical element, imaging optical unit, optical system, projection exposure apparatus, method for producing a structured component, and structured component

An optical element serves for the beam guidance of imaging light in projection lithography. The optical element has a main body and at least one optical surface carried by the main body. At least one coupling unit is arranged on the main body. The coupling unit serves to attach a compensation weight...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HEMBACHER, STEFAN, NEFZI, MARWENE
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:An optical element serves for the beam guidance of imaging light in projection lithography. The optical element has a main body and at least one optical surface carried by the main body. At least one coupling unit is arranged on the main body. The coupling unit serves to attach a compensation weight element for compensating a figure deformation of the optical surface. The result is an optical element which can be provided at the use location with a relatively small figure deformation.