Pellicle assembly, lithographic apparatus, and dynamic gas lock for lithographic apparatus
A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle a...
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| creator | OLSMAN, RAYMOND WONDERGEM, HENDRIKUS JAN VOORTHUIJZEN, WILLEM-PIETER KNAPEN, PETER SIMON ANTONIUS VAN DER ZANDE, WILLEM JOAN VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS VAN DEN EINDEN, WILHELMUS THEODORUS ANTHONIUS JOHANNES DE GROOT, ANTONIUS FRANCISCUS JOHANNES VAN ZWOL, PIETER-JAN MEIJERINK, WOUTER ROGIER PATEL, HRISHIKESH MEIJER, MARCEL PETER KLOOTWIJK, JOHAN HENDRIK VLES, DAVID FERDINAND JANSSEN, JOHANNES JOSEPH KURGANOVA, EVGENIA GIESBERS, ADRIANUS JOHANNES MARIA NASALEVICH, MAXIM ALEKSANDROVICH VAN DEN BOSCH, GERRIT NOTENBOOM, ARNOUD WILLEM PETER, MARIA JANSSEN, PAUL ANDE, CHAITANYA KRISHNA ZDRAVKOV, ALEKSANDAR NIKOLOV |
| description | A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device. |
| format | Patent |
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The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230901&DB=EPODOC&CC=TW&NR=I813572B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230901&DB=EPODOC&CC=TW&NR=I813572B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OLSMAN, RAYMOND</creatorcontrib><creatorcontrib>WONDERGEM, HENDRIKUS JAN</creatorcontrib><creatorcontrib>VOORTHUIJZEN, WILLEM-PIETER</creatorcontrib><creatorcontrib>KNAPEN, PETER SIMON ANTONIUS</creatorcontrib><creatorcontrib>VAN DER ZANDE, WILLEM JOAN</creatorcontrib><creatorcontrib>VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS</creatorcontrib><creatorcontrib>VAN DEN EINDEN, WILHELMUS THEODORUS ANTHONIUS JOHANNES</creatorcontrib><creatorcontrib>DE GROOT, ANTONIUS FRANCISCUS JOHANNES</creatorcontrib><creatorcontrib>VAN ZWOL, PIETER-JAN</creatorcontrib><creatorcontrib>MEIJERINK, WOUTER ROGIER</creatorcontrib><creatorcontrib>PATEL, HRISHIKESH</creatorcontrib><creatorcontrib>MEIJER, MARCEL PETER</creatorcontrib><creatorcontrib>KLOOTWIJK, JOHAN HENDRIK</creatorcontrib><creatorcontrib>VLES, DAVID FERDINAND</creatorcontrib><creatorcontrib>JANSSEN, JOHANNES JOSEPH</creatorcontrib><creatorcontrib>KURGANOVA, EVGENIA</creatorcontrib><creatorcontrib>GIESBERS, ADRIANUS JOHANNES MARIA</creatorcontrib><creatorcontrib>NASALEVICH, MAXIM ALEKSANDROVICH</creatorcontrib><creatorcontrib>VAN DEN BOSCH, GERRIT</creatorcontrib><creatorcontrib>NOTENBOOM, ARNOUD WILLEM</creatorcontrib><creatorcontrib>PETER, MARIA</creatorcontrib><creatorcontrib>JANSSEN, PAUL</creatorcontrib><creatorcontrib>ANDE, CHAITANYA KRISHNA</creatorcontrib><creatorcontrib>ZDRAVKOV, ALEKSANDAR NIKOLOV</creatorcontrib><title>Pellicle assembly, lithographic apparatus, and dynamic gas lock for lithographic apparatus</title><description>A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. 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The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Pellicle assembly, lithographic apparatus, and dynamic gas lock for lithographic apparatus |
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