Pellicle assembly, lithographic apparatus, and dynamic gas lock for lithographic apparatus

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle a...

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Bibliographische Detailangaben
Hauptverfasser:	OLSMAN, RAYMOND, WONDERGEM, HENDRIKUS JAN, VOORTHUIJZEN, WILLEM-PIETER, KNAPEN, PETER SIMON ANTONIUS, VAN DER ZANDE, WILLEM JOAN, VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS, VAN DEN EINDEN, WILHELMUS THEODORUS ANTHONIUS JOHANNES, DE GROOT, ANTONIUS FRANCISCUS JOHANNES, VAN ZWOL, PIETER-JAN, MEIJERINK, WOUTER ROGIER, PATEL, HRISHIKESH, MEIJER, MARCEL PETER, KLOOTWIJK, JOHAN HENDRIK, VLES, DAVID FERDINAND, JANSSEN, JOHANNES JOSEPH, KURGANOVA, EVGENIA, GIESBERS, ADRIANUS JOHANNES MARIA, NASALEVICH, MAXIM ALEKSANDROVICH, VAN DEN BOSCH, GERRIT, NOTENBOOM, ARNOUD WILLEM, PETER, MARIA, JANSSEN, PAUL, ANDE, CHAITANYA KRISHNA, ZDRAVKOV, ALEKSANDAR NIKOLOV
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.