TWI808071B

Provided are a photosensitive composition with which a cured film having excellent heat resistance and pattern formability can be formed, a cured film, an optical filter, a solid image pickup element, an image display device, and an infrared sensor. This photosensitive composition includes an infrar...

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Bibliographische Detailangaben
1. Verfasser:	ARAYAMA, KYOHEI
Format:	Patent
Sprache:	chi
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Provided are a photosensitive composition with which a cured film having excellent heat resistance and pattern formability can be formed, a cured film, an optical filter, a solid image pickup element, an image display device, and an infrared sensor. This photosensitive composition includes an infrared shielding agent A, a polymer component B, and a photoacid generator C. The polymer component B in the photosensitive composition includes, for example, a polymer B1 that includes a repeating unit b1 having a group in which at least one group selected from an acid group or a hydroxyl group is protected by an acid-decomposable group and a repeating unit b2 having a crosslinking group.