TWI805976B

Provided is a film forming method that can form a film having a thickness of 500 µm or more with a single coating of a substrate.The present disclosure is a film forming method using a powder coating material containing a polyphenylene sulfide resin, the method including heating the powder coating m...

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Bibliographische Detailangaben
Hauptverfasser: MIYATANI, TOSHIO, CHIN, SHICHOU, IMADA, HIROTAKE, NAKATANI, YASUKAZU, HONDA, YUKARI
Format: Patent
Sprache:chi
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Beschreibung
Zusammenfassung:Provided is a film forming method that can form a film having a thickness of 500 µm or more with a single coating of a substrate.The present disclosure is a film forming method using a powder coating material containing a polyphenylene sulfide resin, the method including heating the powder coating material at a temperature equal to or higher than a melting point of the polyphenylene sulfide resin and within a range of 250 to 400°C, in which a single coating of a substrate forms a film having a thickness of 500 µm or more; and the obtained film has a surface roughness, Ra, of 0.30 µm or less.