TWI805541B
The purpose of the present invention is to provide a photoresist stripping solution that has an excellent ability to maintain the solubility of a quaternary ammonium hydroxide and excellent temporal stability while maintaining a sufficient ability to strip resists. The present invention pertains to...
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| Format: | Patent |
| Sprache: | chi |
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| Zusammenfassung: | The purpose of the present invention is to provide a photoresist stripping solution that has an excellent ability to maintain the solubility of a quaternary ammonium hydroxide and excellent temporal stability while maintaining a sufficient ability to strip resists. The present invention pertains to a photoresist stripping solution characterized by including dimethyl sulfoxide, a quaternary ammonium hydroxide, an alkylene amine, and a polyhydric alcohol and/or a glycol ether having a molecular weight of 100 or less. The alkylene amine is preferably an ethylene amine represented by general formula (1) (in general formula (1), n is an integer from 1 to 5). |
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