TWI799664B
Provided is a cleaning device capable of removing a deposit, etc., that has adhered to an applicator, even an applicator in which a high-viscosity application solution is used. Specifically, a cleaning device for cleaning a deposit that has adhered to an applicator extending in one direction formed...
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Format: | Patent |
Sprache: | chi |
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Zusammenfassung: | Provided is a cleaning device capable of removing a deposit, etc., that has adhered to an applicator, even an applicator in which a high-viscosity application solution is used. Specifically, a cleaning device for cleaning a deposit that has adhered to an applicator extending in one direction formed on a substrate-facing surface that faces a substrate, wherein: the cleaning device is equipped with a cleaning unit that comes into contact with the applicator, and a moving device that causes the cleaning unit to move relatively in the longitudinal direction of the applicator while in contact with the applicator; the cleaning unit is equipped with a first cleaning portion disposed on the front side of the cleaning movement direction, and a second cleaning portion disposed on the rear side of the first cleaning portion; the first cleaning portion has a first cleaning member that contacts the substrate-facing surface and an inclined side surface that is continuous with the substrate-facing surface in the applicator; |
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