COMPUTER?READABLE MEDIUM, METHOD OF PROCESSING SUBSTRATES, AND SYSTEM FOR PROCESSING SUBSTRATES

COMPUTER?READABLE MEDIUM, METHOD OF PROCESSING SUBSTRATES, AND SYSTEM FOR PROCESSING SUBSTRATES

The systems and methods discussed herein are for a cluster tool that can be used for MOSFET device fabrication, including NMOS and PMOS devices. The cluster tool includes process chambers for pre-cleaning, metal-silicide or metal-germanide film formation, and surface protection operations such as ca...

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Bibliographische Detailangaben
Hauptverfasser: HUNG, RAYMOND HOIMAN, LI, XUEBIN, CHU, SCHUBERT S, SANCHEZ, ERROL ANTONIO C, THAREJA, GAURAV, LIU, PATRICIA M
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:The systems and methods discussed herein are for a cluster tool that can be used for MOSFET device fabrication, including NMOS and PMOS devices. The cluster tool includes process chambers for pre-cleaning, metal-silicide or metal-germanide film formation, and surface protection operations such as capping and nitridation. The cluster tool can include one or more process chambers configured to form a source and a drain. The devices fabricated in the cluster tool are fabricated to have at least one protective layer formed over the metal-silicide or metal-germanide film to protect the film from contamination during handling and transfer to separate systems.