A METHOD OF DETERMINING A MEASUREMENT RECIPE AND ASSOCIATED METROLOGY METHODS AND APPRATUSES

Disclosed is a method of determining a measurement recipe for measurement of in-die targets located within one or more die areas of an exposure field. The method comprises obtaining first measurement data relating to measurement of a plurality of reference targets and second measurement data relatin...

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Bibliographische Detailangaben
Hauptverfasser: VAN LAARHOVEN, HENDRIK ADRIAAN, RUTIGLIANI, VITO DANIELE, VAN DEN BROEK, BASTIAAN MAURICE
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Disclosed is a method of determining a measurement recipe for measurement of in-die targets located within one or more die areas of an exposure field. The method comprises obtaining first measurement data relating to measurement of a plurality of reference targets and second measurement data relating to measurement of a plurality of in-die targets, said targets having respective different overlay biases and measured using a plurality of different acquisition settings for acquiring said measurement data. One or more machine learning models are trained using said first measurement data to obtain a plurality of candidate measurement recipes, wherein said candidate measurement recipes comprise a plurality of combinations of a trained machine learned model and a corresponding acquisition setting; and a preferred measurement recipe is determined from said candidate measurement recipes using said second measurement data.