Microelectromechanical system microphone structure and manufacturing method thereof

A microelectromechanical system microphone structure and a manufacturing method thereof are provided. Substrate, first side plate, second side plate and cover plate are made through process combination of bonding, opening, pressing film, copper etching, solder mask and molding. ASIC is placed on cov...

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Bibliographische Detailangaben
Hauptverfasser: YU, YUNG HSIANG, YANG, SSU CHIEH, CHEN, SHENG KAI, YANG, SHANG HSIEN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A microelectromechanical system microphone structure and a manufacturing method thereof are provided. Substrate, first side plate, second side plate and cover plate are made through process combination of bonding, opening, pressing film, copper etching, solder mask and molding. ASIC is placed on cover plate by dispensing, MEMS is placed at the through hole of cover plate through dispensing. Closed space is surrounded by substrate, first side plate, second side plate, cover plate and MEMS to form a closed chamber. Therefore, the efficiency of providing MEMS to form closed chamber structure may be achieved.