TWI795481B

To clean a substrate powerfully.SOLUTION: A substrate processing device according to an embodiment includes: a holding part; a first cleaning body; a second cleaning body; and a third cleaning body. The holding part holds a substrate. The first cleaning body discharges a fluid to one of an upper sur...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MOURI, NOBUHIKO, KODAMA, TERUHIKO, OBARU, TAKANORI, TAKIGUCHI, YASUSHI
Format:	Patent
Sprache:	chi
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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