TWI795481B

TWI795481B

To clean a substrate powerfully.SOLUTION: A substrate processing device according to an embodiment includes: a holding part; a first cleaning body; a second cleaning body; and a third cleaning body. The holding part holds a substrate. The first cleaning body discharges a fluid to one of an upper sur...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MOURI, NOBUHIKO, KODAMA, TERUHIKO, OBARU, TAKANORI, TAKIGUCHI, YASUSHI
Format: Patent
Sprache:chi
Schlagworte:
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:To clean a substrate powerfully.SOLUTION: A substrate processing device according to an embodiment includes: a holding part; a first cleaning body; a second cleaning body; and a third cleaning body. The holding part holds a substrate. The first cleaning body discharges a fluid to one of an upper surface and a lower surface of the substrate held by the holding part or contacts with the one surface to clean the one surface. The second cleaning body contacts with the other of the upper surface and the lower surface of the substrate held by the holding part to clean the other surface. The third cleaning body contacts with an end part of the substrate held by the holding part to clean the end part.SELECTED DRAWING: Figure 24