Substrate processing apparatus and substrate conveyance method
The invention provides a substrate processing apparatus and a substrate transfer method. A second conveyance mechanism (23) of the substrate processing apparatus (100) is provided with a first non-common hand (H_F), a second non-common hand (H_S), and the M number of common hands (H1-HM). In one tra...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a substrate processing apparatus and a substrate transfer method. A second conveyance mechanism (23) of the substrate processing apparatus (100) is provided with a first non-common hand (H_F), a second non-common hand (H_S), and the M number of common hands (H1-HM). In one transfer cycle, the M number of common hands (H_1-H_M) support a substrate (W) before processing and a substrate (W) after processing at different timings. In one transfer cycle, the first non-common hand (H_F) only supports the substrate (W) before processing. In one transfer cycle, the second non-shared hand (HS) supports only the processed substrate (W). In a state that the second conveyance mechanism (23) has the N number of substrates (W) received from the substrate placement unit (29), the second non-common hand (H_S) does not support the substrates (W), and the M number of common hands (H_1-H_M) and the first non-common hand (H_F) support the substrates (W). |
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