TWI787170B

An object of the present invention is to provide a cleaning liquid which is to be used for removing residue of a photoresist pattern or residue of an etching residue, and which is a cleaning agent that has excellent anticorrosion property for metal including cobalt. A cleaning method using the clean...

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Bibliographische Detailangaben
Hauptverfasser:	GOTO, TATSUO, SEKI, KENJI
Format:	Patent
Sprache:	chi
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	An object of the present invention is to provide a cleaning liquid which is to be used for removing residue of a photoresist pattern or residue of an etching residue, and which is a cleaning agent that has excellent anticorrosion property for metal including cobalt. A cleaning method using the cleaning liquid is also provided. The solution of the present invention is a cleaning liquid comprising: a hydrofluoric acid (A); a tetrazole compound (B); and water (C). The tetrazole compound (B) is preferably a compound expressed by following formula (B1), wherein R1 is a hydrogen atom or an organic group; and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an organic group.