Photosensitive resin composition, cured product, black matrix and image display device

Provided is a high-resistance photosensitive resin composition having excellent light-blocking properties and insulation properties. This photosensitive resin composition contains (a) an alkali-soluble resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator and (d) a coloring ma...

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Hauptverfasser: AZUMA, NAOTO, UEMATSU, TAKUYA
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Provided is a high-resistance photosensitive resin composition having excellent light-blocking properties and insulation properties. This photosensitive resin composition contains (a) an alkali-soluble resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator and (d) a coloring material, and is such that the photopolymerization initiator (c) contains a photopolymerization initiator (c1) represented by general formula (1), and the coloring material (d) contains high-resistance carbon black (d1). (In formula (1), R1, R2 and R3 may be the same as, or different from, each other and each denote an optionally substituted alkyl group or the like, R4 denotes an optionally substituted alkyl group or the like, R5 denotes an optionally substituted alkyl group or the like, A denotes an oxygen atom or a sulfur atom, m is an integer between 0 and 4, n is an integer between 0 and 4 and p is an integer between 0 and 4. The aromatic rings included in formula (1) may include fused rings, but the number of ri