TWI784668B

TWI784668B

Provided is a dustproof structure for an alignment unit, which is suitable as a dustproof cover for an OAS type alignment unit.　This dustproof structure for an alignment unit comprises a frame that forms an opening and a dustproof film that is stretched and supported on one side of the frame so as t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KUROKAWA, KENICHI, HIRANO, MASAKATSU
Format: Patent
Sprache:chi
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:Provided is a dustproof structure for an alignment unit, which is suitable as a dustproof cover for an OAS type alignment unit.　This dustproof structure for an alignment unit comprises a frame that forms an opening and a dustproof film that is stretched and supported on one side of the frame so as to cover the opening, and also comprises a securing portion for mechanically securing the dustproof structure to the alignment unit and/or a magnet for securing the dustproof structure to the alignment unit.