Electron beam apparatus

An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator...

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Bibliographische Detailangaben
Hauptverfasser:	BAGGEN, MARCEL KOENRAAD MARIE, HEMPENIUS, PETER PAUL, KREMERS, MAARTEN FRANS JANUS, VAN DE RIJDT, JOHANNES HUBERTUS ANTONIUS, HOL, SVEN ANTOIN JOHAN, BOSCH, NIELS JOHANNES MARIA, VAN DE GROES, HENRICUS MARTINUS JOHANNES, VAN KEMPEN, ROBERTUS JACOBUS THEODORUS, KIMMAN, MAARTEN HARTGER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.