Photocrosslinkable fluoropolymer coating composition and coating layer formed therefrom

The present disclosure relates to a photocrosslinkable fluoropolymer coating composition, a coating layer comprising a photocrosslinked fluoropolymer and a process for forming the coating layer. Coating layers comprising the crosslinked fluoropolymer have low dielectric constants, low water absorpti...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WHELAND, ROBERT CLAYTON, CHEN, XUDONG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present disclosure relates to a photocrosslinkable fluoropolymer coating composition, a coating layer comprising a photocrosslinked fluoropolymer and a process for forming the coating layer. Coating layers comprising the crosslinked fluoropolymer have low dielectric constants, low water absorptivity, good adhesion to conventional electronic device substrates, and are able to be photoimaged so as to provide the very fine features needed for modern electronic devices.